Please use this identifier to cite or link to this item:
https://www.um.edu.mt/library/oar/handle/123456789/23938
Title: | Eigen-patch iris super-resolution for iris recognition improvement |
Authors: | Alonso-Fernandez, Fernando Farrugia, Reuben A. Bigun, Josef |
Keywords: | High resolution imaging Principal components analysis Machine learning Optical pattern recognition Biometric identification -- Technological innovation Pattern recognition systems |
Issue Date: | 2015 |
Publisher: | Institute of Electrical and Electronics Engineers Inc. |
Citation: | Alonso-Fernandez, F., Farrugia, R., & Bigun, J. (2015). Eigen-patch iris super-resolution for iris recognition improvement. 23rd European Signal Processing Conference (EUSIPCO), Nice. 76-80. |
Abstract: | Low image resolution will be a predominant factor in iris recognition systems as they evolve towards more relaxed acquisition conditions. Here, we propose a super-resolution technique to enhance iris images based on Principal Component Analysis (PCA) Eigen-transformation of local image patches. Each patch is reconstructed separately, allowing better quality of enhanced images by preserving local information and reducing artifacts. We validate the system used a database of 1,872 near-infrared iris images. Results show the superiority of the presented approach over bilinear or bicubic interpolation, with the eigen-patch method being more resilient to image resolution reduction. We also perform recognition experiments with an iris matcher based 1D Log-Gabor, demonstrating that verification rates degrades more rapidly with bilinear or bicubic interpolation. |
URI: | https://www.um.edu.mt/library/oar//handle/123456789/23938 |
Appears in Collections: | Scholarly Works - FacICTCCE |
Files in This Item:
File | Description | Size | Format | |
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OA111 (5).pdf | 318.91 kB | Adobe PDF | View/Open |
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