Please use this identifier to cite or link to this item: https://www.um.edu.mt/library/oar/handle/123456789/23938
Title: Eigen-patch iris super-resolution for iris recognition improvement
Authors: Alonso-Fernandez, Fernando
Farrugia, Reuben A.
Bigun, Josef
Keywords: High resolution imaging
Principal components analysis
Machine learning
Optical pattern recognition
Biometric identification -- Technological innovation
Pattern recognition systems
Issue Date: 2015
Publisher: Institute of Electrical and Electronics Engineers Inc.
Citation: Alonso-Fernandez, F., Farrugia, R., & Bigun, J. (2015). Eigen-patch iris super-resolution for iris recognition improvement. 23rd European Signal Processing Conference (EUSIPCO), Nice. 76-80.
Abstract: Low image resolution will be a predominant factor in iris recognition systems as they evolve towards more relaxed acquisition conditions. Here, we propose a super-resolution technique to enhance iris images based on Principal Component Analysis (PCA) Eigen-transformation of local image patches. Each patch is reconstructed separately, allowing better quality of enhanced images by preserving local information and reducing artifacts. We validate the system used a database of 1,872 near-infrared iris images. Results show the superiority of the presented approach over bilinear or bicubic interpolation, with the eigen-patch method being more resilient to image resolution reduction. We also perform recognition experiments with an iris matcher based 1D Log-Gabor, demonstrating that verification rates degrades more rapidly with bilinear or bicubic interpolation.
URI: https://www.um.edu.mt/library/oar//handle/123456789/23938
Appears in Collections:Scholarly Works - FacICTCCE

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