Browsing by Subject Semiconductor wafers
Showing results 1 to 10 of 10
Issue Date | Title | Author(s) |
2004 | Czochralski process for growing single crystal silicon by controlling the cooling rate : WO 2001/021861 | McCallum, K. D.; Alexander, W. B.; Banan, M.; Falster, R. J.; Holzer, J. C.; Johnson, B. K.; Kim, C. B.; Kimbel, S. L.; Lu, Z.; Mutti, P.; Voronkov, V. V.; Mule’ Stagno, Luciano; Libbert, J. L. |
2001 | Epitaxial silicon wafers substantially free of grown-in defects : U.S. Patent No. 6,284,039 B1 | Mule’ Stagno, Luciano; Fei, Lu; Holzer, Joseph C.; Korb, Harold W.; Falster, Robert J. |
2003 | Epitaxial wafer substantially free of grown-in defects : U. S. Patent No. 6,565,649 B2 | Mule’ Stagno, Luciano; Fei, Lu; Holzer, Joseph C.; Korb, Harold W.; Falster, Robert J. |
2003 | Ideal oxygen precipitating silicon wafers with nitrogen/carbon stabilized oxygen precipitate nucleation centers and process for making the same : U. S. Patent Application Publication No. 2003/0136961 A1 | Mule’ Stagno, Luciano; Libbert, Jeffrey L.; Phillips, Richard J.; Kulkarni, Milind; Banan, Mohsen; Brunkhorst, Stephen J. |
1998 | An investigation of the limit of detection and the scattering dependence of the optical precipitate profiler (OPP) | Mule’ Stagno, Luciano; Hill, D. E.; Standley, R.; Olmo, M.; Holzer, J. C.; Falster, R.; Fraundorf, P. |
2003 | Method for producing czochralski silicon free of agglomerated self-interstitial defects : U. S. Patent No. 6,635,587 B1 | Mule’ Stagno, Luciano; Libbert, Jeffrey L.; Holzer, Joseph C. |
2001 | Method for producing czochralski silicon free of agglomerated self-interstitial defects : WO 01/21865 A1 | Mule’ Stagno, Luciano; Libbert, Jeffrey L.; Holzer, Joseph C. |
2007 | Process for making silicon wafers with stabilized oxygen precipitate nucleation centers : U. S. Patent No. 7,201,800 B2 | Mule’ Stagno, Luciano; Libbert, Jeffrey L.; Phillips, Richard J.; Kulkarni, Milind; Banan, Mohsen; Brunkhorst, Stephen J. |
2004 | Silicon wafers with stabilized oxygen precipitate nucleation centers and process for making the same : U. S. Patent No. 6,808,781 B2 | Mule’ Stagno, Luciano; Libbert, Jeffrey L.; Phillips, Richard J.; Kulkarni, Milind; Banan, Mohsen; Brunkhorst, Stephen J. |
2006 | Single crystal silicon wafer having an epitaxial layer substantially free from grown-in defects : U. S. Patent No. 7,097,718 B2 | Mule’ Stagno, Luciano; Fei, Lu; Holzer, Joseph C.; Korb, Harold W.; Falster, Robert J. |